Legal and intellectual property notice

This page records the copyright, intellectual property and trademark position for Silva Trading Inc. and for the material published under the EVEglyph Design name.

Site and company

EVEglyph Design mark and design system

The mark, the design system, the published reference models and the additive delivery methodology are the original work of Dany Theriault, asserted under the Berne Convention and the Copyright Act (Canada). Key ID EgD-KEY-2026-07. No licence to reproduce, adapt or derive is granted by publication. Individual repositories published under EVEglyphDesign carry their own licence terms, which govern that repository's contents.

Third-party trademarks

Independent. Not affiliated with, endorsed by or sponsored by SAP SE or any service provider. SAP, S/4HANA, SAP Datasphere and SAP Analytics Cloud are trademarks of SAP SE. All other product and company names are the trademarks of their respective owners and are used for identification only.

Client material

No client data, system name or screenshot is published on this site or in the public repositories. Engagements are described by sector and by the shape of the work only.

EVEglyph Design mark — triangle, inscribed circle and bowl — EVEglyph Design